Laser patterning process is a dry process that forms circuit or element patterns necessary as a device.
By irradiating laser beam, variety of coated functional thin film on glass or plastic film substrates are removed selectively.
Less number of process steps. Less capital-investment spending.
Photo mask is unnecessary. Easy pattern change is possible by inputting data.
Dry process without developer and corrosive liquid.
Therefore running cost and environmental load can be reduced.
Capable of <50μm microscopic pattern.
Unnecessary to change mask depending on patterns
Applicable to ink-unfitted materials.
Forming thin-film pattern of <100nm is possible.
The system has been widely used for especially electrode formation of transparent films such as ITO, silver nanowire, CNT and silver paste(conductive paste electrode).
・Laser light source is selectable ranging from near-infrared wavelength to ultraviolet wavelength and it corresponds to various applications.
・Adjustable patterning by highspeed launch-power controll of laser light.
・Uniform processing by steady laser light scan speed.
・High-accuracy patterning combined degital galvano-scanner and driving stage.
・Offering 3types of systems ranging from R&D use to mass-produce use.